SCALPEL mask-membrane charging-Reference-Cited by-同舟云学术

SCALPEL mask-membrane charging

Published:1999-05 Issue:1-4 Volume:46 Page:223-226
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Mkrtchyan M.,Gasparyan A.,Mkhoyan K.,Liddle A.,Novembre A.,Muller D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. The SCALPEL proof of concept system

2. Scanning Electron Microscopy. Physics of Image Formation and Microanalysis;Reimer,1989

3. Resist charging in electron beam lithography

4. Transmission Electron Microscopy. Physics of Image Formation and Microanalysis;Reimer,1989

5. Electron Energy-Loss Spectroscopy in The Electron Microscopy;Egerton,1996

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask-membrane impact on image blur in SCALPEL;Microelectronic Engineering;2001-09

2. Electron Scattering and Related Phenomena in Scattering with Angular Limitation Projection Electron Lithography (SCALPEL*);Japanese Journal of Applied Physics;2000-12-30

3. High-performance membrane mask for electron projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

4. Calculation of surface potential and beam deflection due to charging effects in electron beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

5. Determination of the possible magnitude of the charging effect in a SCALPEL mask membrane;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999