Author:
Harriott L.R.,Berger S.D.,Biddick C.,Blakey M.I.,Bowler S.W.,Brady K.,Camarda R.M.,Connelly W.F.,Crorken A.,Custy J.,DeMarco R.,Farrow R.C.,Felker J.A.,Fetter L.,Freeman R.,Hopkins L.,Huggins H.A.,Knurek C.S.,Kraus J.S.,Liddle J.A.,Mkrtychan M.,Novembre A.E.,Peabody M.L.,Tarascon R.G.,Wade H.H.,Waskiewicz W.K.,Watson G.P.,Werder K.S.,Windt D.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference12 articles.
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3. Error budget analysis of the SCALPEL(R) mask for sub-0.2 μm lithography
4. Particle–particle interaction effects in image projection lithography systems
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