Lifetime enhancement of a multicusp ion source for lithography

Author:

Lee Y.,Gough R.A.,Kunkel W.B.,Leung K.N.,Vujic J.,Williams M.D.,Wutte D.,Yang F.L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Production of low energy spread ion beams with multicusp sources

2. Y. Lee, R.A. Gough, W.B. Kunkel, K.N. Leung, L.T. Perkins, D.S. Pickard, L. Sun, J. Vujic, M.D. Williams, and D. Wutte, Nucl. Instrum. Methods Phys. Res. B

3. Proceedings of the 6th International Conference on Ion Sources;Melnychuk,1995

4. Beam diagnostic techniques for a small‐size high‐efficiency radio‐frequency ion source

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1. Quest for high brightness, monochromatic noble gas ion sources;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-11

2. Characterization of a compact filament-driven multicusp ion source for low energy time-of-flight Rutherford backscattering spectrometry application;Review of Scientific Instruments;2004-05

3. Co-axial multicusp source for low axial energy spread ion beam production;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1999-09

4. Maskless micro-ion-beam reduction lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

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