Author:
Ngo V. V.,Barletta W.,Gough R.,Lee Y.,Leung K. N.,Zahir N.,Patterson D.
Cited by
7 articles.
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1. Resolution improvement for a maskless microion beam reduction lithography system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003
2. Prospects of ion projection techniques for maskless implantation at high ion energies;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-04
3. Ion beam technologies in the semiconductor world (plenary);Review of Scientific Instruments;2002-02
4. Improvement in brightness of multicusp-plasma ion source;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002
5. Thermomechanical simulations for microbeam reduction lithography;SPIE Proceedings;2000-07-21