Effects of gas ring position and mesh introduction on film quality and thickness uniformity-Reference-Cited by-同舟云学术

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Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Published:1997-03 Issue:1-3 Volume:45 Page:98-101
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Hong Seungbum,Kim Eunah,Jiang Zhong-Tao,Bae Byeong-Soo,No Kwangsoo,Lim Sung-Chul,Woo Sang-Gyun,Koh Young-Bum

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference8 articles.

1. Investigation of MIS structures with Al2O3 insulation layers obtained by d.c. reactive sputtering

2. Properties of rf‐sputtered Al2O3 films deposited by planar magnetron

3. Reactive deposition of low loss Al2O3 optical waveguides by modified dc planar magnetron sputtering

4. Mathematical simulation of transport processes in modern sputter-deposition techniques of thin films

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1. Enhanced Deposition Rate of Photo-Induce Hydrophilic TiO₂ Thin Films Prepared by Pulsed DC Reactive Magnetron Sputtering;Advanced Materials Research;2013-09

2. The thickness uniformity of films deposited by magnetron sputtering with rotation and revolution;Surface and Coatings Technology;2006-03

3. Local structures and electronic structures of HfON thin films: x-ray absorption fine structure study and first-principles calculations;X-Ray Spectrometry;2006

4. High transmittance attenuated phase shifting mask of chromium aluminum oxynitride;21st Annual BACUS Symposium on Photomask Technology;2002-03-11

5. Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser;Japanese Journal of Applied Physics;2000-11-15

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