Structure and electric properties of TiO2 films prepared by cold plasma torch under atmospheric pressure-Reference-Cited by-同舟云学术

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Structure and electric properties of TiO2 films prepared by cold plasma torch under atmospheric pressure

Published:1996-10 Issue:1 Volume:41 Page:143-147
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Ha H.,Moon B.K.,Horiuchi T.,Inushima T.,Ishiwara H.,Koinuma H.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference12 articles.

1. The Composition and Properties of PECVD Silicon Oxide Films

2. Charging of pattern features during plasma etching

3. Surface cleaning using sputtering

4. Ar-ion bombardment effects onZrO2surfaces

5. Development and application of a microbeam plasma generator

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