Chemical vapour deposition of copper from (hfac)CuL compounds-Reference-Cited by-同舟云学术

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Chemical vapour deposition of copper from (hfac)CuL compounds

Published:1995-03 Issue:6 Volume:14 Page:699-732
ISSN:0277-5387
Container-title:Polyhedron
language:en
Short-container-title:Polyhedron

Author:

Hampden-Smith Mark J.,Kodas Toivo T.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry

Reference98 articles.

1. The Chemistry of Metal CVD,1994

2. Chemical Vapor Deposition: Principles and Applications;Hitchman,1993

3. Microelectronics Processing;Hess,1989

4. Selective metalization by chemical vapor deposition

5. Silicon Processing for the VLSI Era;Wolf,1987

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