Arrhenius behavior of electron attachment to CH3Br from 303 to 1100K-Reference-Cited by-同舟云学术

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Arrhenius behavior of electron attachment to CH3Br from 303 to 1100K

Published:2014-05 Issue: Volume:365-366 Page:75-79
ISSN:1387-3806
Container-title:International Journal of Mass Spectrometry
language:en
Short-container-title:International Journal of Mass Spectrometry

Author:

Miller Thomas M.,Shuman Nicholas S.,Viggiano Albert A.

Funder

Air Force Office of Scientific Research

nstitute for Scientific Research of Boston College

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation

Reference35 articles.

1. Comparative studies of dissociative electron attachment to methyl halides

2. Dissociative Thermal Electron Attachment to Some Aliphatic Chloro, Bromo, Iodo Compounds

3. Electron disappearance in pulse irradiated CH3Cl, C2H5Cl, CH3Br, and C2H5Br

4. Application of electron cyclotron resonance technique in studies of electron capture processes in the thermal energy range

5. Rate coefficients for the attachment reactions of electrons with c-C7F14, CH3Br, CF3Br, CH2Br2and CH3I determined between 200 and 600K using the FALP technique

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