Impact of different stochastic line edge roughness patterns on measurements in scatterometry - A simulation study
Author:
Publisher
Elsevier BV
Subject
Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation
Reference44 articles.
1. Ellipsometric scatterometry for metrology of sub-0.1μm-linewidth structures;Minhas;Appl. Opt.,1998
2. Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring;Huang;Thin Solid Films,2004
3. Metrology of subwavelength photoresist gratings using optical scatterometry;Raymond;J. Vac. Sci. Technol., B,1995
4. Multiparameter grating metrology using optical scatterometry;Raymond;J. Vac. Sci. Technol., B,1997
5. Evaluation of scatterometry tools for critical dimension metrology;Wurm,2005
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