Affiliation:
1. University College Dublin
Abstract
Manufacturing-induced sidewall roughness has a significant impact on the diffraction efficiency of extreme ultraviolet (EUV) gratings and masks, which could be evaluated by a Debye-Waller damping factor. The rough profile models of line structures are always parallel to the surface for the reflective elements. In this manuscript, a model of rough lines along the thickness direction is established, which cannot be ignored for high aspect ratio transmission gratings. Numerical calculations are carried out using both a rigorous model and a Fraunhofer approximation model. The two models agree with each other on the low-order transmission efficiencies, and the fitted Debye-Waller factor indicates a larger roughness value than that of the model due to the absorption of EUV irradiation for 90° sidewall angle. When the sidewall angle is smaller than 88°, an extra degree of freedom is introduced to the traditional Debye-Waller factor-based formula. The +1-order transmission efficiency and absorptivity with smooth and rough sidewalls are also analyzed, as well as the effect of incidence angle, wavelength and grating thickness.
Funder
National Natural Science Foundation of China
Subject
Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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