Development of a sub-micron ion beam system in the keV range
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. mubeam system for study of single event upset of semiconductor devices
2. Studies of charge collection mechanisms in SOI devices using a heavy-ion microbeam
3. Microprobe as implanter for semiconductor devices
4. Submicron microbeam apparatus using a single-ended accelerator with very high voltage stability
5. APPLICATION OF MICRO-PIXE CAMERA TO ELEMENTAL ANALYSIS OF A SINGLE CELL
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Design of an apertureless two-stage acceleration lens for a single-ion implantation system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2023-08
2. Reduction of the divergence angle of an incident beam to enhance the demagnification factor of a two-stage acceleration lens in a gas ion nanobeam system of several tens of keV;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2018-04
3. High spatial resolution and high brightness ion beam probe for in-situ elemental and isotopic analysis;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2018-03
4. Beam Diameter Reduction by Optimization of an Extraction Condition in a Compact Ion Microbeam System;Physics Procedia;2017
5. Note: Proton microbeam formation with continuously variable kinetic energy using a compact system for three-dimensional proton beam writing;Review of Scientific Instruments;2015-03
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