Reduction of the divergence angle of an incident beam to enhance the demagnification factor of a two-stage acceleration lens in a gas ion nanobeam system of several tens of keV-Reference-Cited by-同舟云学术

Reduction of the divergence angle of an incident beam to enhance the demagnification factor of a two-stage acceleration lens in a gas ion nanobeam system of several tens of keV

Published:2018-04 Issue: Volume:420 Page:12-17
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Ishii Yasuyuki^ORCID,Kojima Takuji

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference18 articles.

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2. Focused ion beam repair of lithographic masks;Wagner;Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms,1989

3. Progress in extreme ultraviolet mask repair using a focused ion beam;Liang;J. Vac. Sci. Technol. B Microelectron. Nanometer Struct.,2000

4. Image quality improvement in focused ion beam photomask repair system;Yasaka;J. Vac. Sci. Technol. B Microelectron. Nanometer Struct.,2008

5. Focused Ion Beam System;Utlut,2007

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