The crystallisation of deep amorphous wells in silicon produced by ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference6 articles.
1. Orientation Dependence of Lateral Solid-Phase-Epitaxial Growth in Amorphous Si Films
2. Annealing behaviour of BF2+ implanted (001) and (111) Si inside miniature size oxide openings
3. Mask-size dependence of lattice defects generated by B- and As-implantation into submicron Si areas
4. Gate-edge effects on SPE regrowth from As+-implanted Si
5. G.L. Olson, J.A. Roth, in: D.J.T. Hurle (Ed.), Handbook of Crystal Growth, Elsevier, Amsterdam, 1994, Chapter 7
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Solid-Phase Epitaxy;Handbook of Crystal Growth;2015
2. Microstructural changes in silicon induced by patterning with focused ion beams of Ga, Si and Au;Ultramicroscopy;2013-04
3. The potential for the fabrication of wires embedded in the crystalline silicon substrate using the solid phase segregation of gold in crystallising amorphous volumes;Materials Science and Engineering: B;2004-05
4. Defective Crystal Recovered from the Crystallization of Potassium-Doped Amorphous Silicon Films;Journal of The Electrochemical Society;2003
5. Minimisation of spanning dislocations in the crystallisation of deep amorphous silicon wells through the alignment of volume edges with fast growth directions;Materials Science and Engineering: B;2003-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3