Microprobe as implanter for semiconductor devices
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference9 articles.
1. Ion beam synthesis of epitaxial silicides: fabrication, characterization and applications
2. J. Adamczewski, A. Stephan, J. Meijer, H.H. Bukow, C. Rolfs, these proceedings (ICNMTA-6), Nucl. Instr. and Meth. B 158 (1999) 119
3. Operation of the new microprobe at Bochum
4. Progress in ion projection lithography
5. High energy implantation by ion projection
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