Defect production mechanisms in metals and covalent semiconductors
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference43 articles.
1. Implantation and transient B diffusion in Si: The source of the interstitials
2. Implantation and transient boron diffusion: the role of the silicon self-interstitial
3. Transient Phosphorus Diffusion Below the Amorphization Threshold
4. Intercascade annihilation of freely migrating defects
5. Freely-Migrating Defects: Their Production and Interaction with Cascade Remnants
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