Author:
Pugacheva T.S.,Jurabekova F.G.,Miyagawa Y.,Valiev S.Kh.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
7 articles.
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1. Sputter-deposited low-stress boron carbide films;Journal of Applied Physics;2020-11-07
2. Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering;Journal of Materials Science;2016-08-01
3. The Effect of the Molecular Mass on the Sputtering of Si, SiC, Ge, and GaAs by Electrosprayed Nanodroplets at Impact Velocities up to 17 km/s;Aerosol Science and Technology;2015-03-06
4. Sputtering of Si, SiC, InAs, InP, Ge, GaAs, GaSb, and GaN by electrosprayed nanodroplets;Journal of Applied Physics;2013-11-14
5. Sputtering yields of Si, SiC, and B4C under nanodroplet bombardment at normal incidence;Journal of Applied Physics;2009-09