Electron beam induced selective etching and deposition technology
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science
Reference14 articles.
1. New selective deposition technology by electron-beam induced surface reaction
2. Electron‐beam fabrication of 80‐Å metal structures
3. Photodeposition of metal films with ultraviolet laser light
4. Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
5. S. Matsui, T, Ichihashi and M. Mito, B7, 1182 (1989).
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