1. Sub-Micron Mesotaxial CoSi2 Wires
2. Mesotaxy: Single‐crystal growth of buried CoSi2layers
3. Formation of CoSi2 Wires by Maskless Implantation with the Focused Ion Beam
4. K.-H. Heinig, M. Voelskow, J. Matthäi, A. Zetzsche and C. Treutler, Proc. Int. Conf. on Energy Pulse Modification of Semiconductors and Related Materials, EPM 1984, Dresden, September 25–28 (1984) p. 280.
5. K.-H. Heinig, Proc. Int. Conf. on Energy Pulse Modification of Semiconductors and Related Materials, EPM 1984, Dresden, September 25–28 (1984) p. 265.