Iodine Induced Damage in Semiconductor Materials During Heavy Ion Recoil Elastic Recoil Detection Analysis-Reference-Cited by-同舟云学术

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Iodine Induced Damage in Semiconductor Materials During Heavy Ion Recoil Elastic Recoil Detection Analysis

Published:1996 Issue: Volume: Page:849-852
ISSN:
Container-title:Ion Beam Modification of Materials
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Author:

WALKER Scott R.,JOHNSTON Peter N.,BUBB Ian F.,STANNARD Warren B.,JAMIESON David N.,DOOLEY Sean P.,COHEN David D.,DYTLEWSKI Nick,MARTIN Jarrod W.

Publisher

Elsevier

Reference6 articles.

1. Mass and energy dispersive recoil spectrometry of MOCVD grown AlxGa1−xAs

2. Mass and energy dispersive recoil spectrometry of Si Ge1− grown by electron beam evaporation

3. RBS and recoil spectrometry analysis of CoSi2 formation on GaAs

4. J.A. Davies, Invited Paper, Applications of Ion Beam Analysis Workshop, Lucas Heights, 1–3 Feb. 1995

5. Setup for materials analysis with heavy ion beams at the Munich MP tandem

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