Reactive pulse plasma crystallization of TiN layers on substrates at 500 K
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
1. TiN coatings on steel
2. Reactive ion plating (RIP) with auxiliary discharge and the influence of the deposition conditions on the formation and properties of TiN films
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4. The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x
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