In-situ dry etching of InP using phosphorus trichloride and regrowth inside a chemical beam epitaxial growth chamber
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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2. Radial InP/InAsP/InP heterostructure nanowires on patterned Si substrates using self-catalyzed growth for vertical-type optical devices;Applied Physics Letters;2015-01-05
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4. Position-controlled InP nanowires with 10–100 μm pitches using Au-deposited SiO2/InP patterned substrates;Applied Physics Letters;2014-02-10
5. Photodissociation Dynamics of Phosphorus Trichloride (PCl3) at 235 nm Using Resonance Enhanced Multiphoton Ionization (REMPI) with Time-of-Flight (TOF) Mass Spectrometry;The Journal of Physical Chemistry A;2010-04-07
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