Plasma-enhanced chemical vapour deposition of A1N (100) on Si (100): Microstructural study of the interlayers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference16 articles.
1. Intrinsic stress in A1N prepared by dual-ion-beam sputtering
2. Acoustoelectric parameters of aluminium nitride epitaxial layers
3. Laser‐induced chemical vapor deposition of AlN films
4. Plasma-enhanced chemical vapour deposition of AlN coatings on graphite substrates
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1. Chemical vapour deposition of polycrystalline AlN films from AlCl3–NH3 mixtures: II — surface morphology and mechanisms of preferential orientation at low-pressure;Thin Solid Films;2002-03
2. A tunable filter with collinear acoustooptical TE-TM mode conversion in a GaAs-AlAs multiquantum-well waveguide;IEEE Journal of Quantum Electronics;1999-05
3. Elastic-filtered electron diffraction for structure determination of AIN specimen;Journal of Electron Microscopy;1999-01-01
4. Deposition of aluminium nitride films by electron cyclotron resonance plasma-enhanced chemical vapour deposition;Surface and Coatings Technology;1998-01
5. Growth of Group III Nitrides. A Review of Precursors and Techniques;Chemistry of Materials;1996-01-01
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