The growth mechanism of 〈100〉 oriented AlN thin films by low-frequency plasma-enhanced metalorganic chemical vapour deposition process
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference15 articles.
1. Plasma CVD of Amorphous AlN from Metalorganic Al Source and Properties of the Deposited Films
2. Plasma-enhanced chemical vapour deposition of AlN coatings on graphite substrates
3. Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD
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