Kinetics of the very low pressure pyrolysis of trimethylgallium and arsine
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference16 articles.
1. Reactions in Omcvd: Detection of Gas Phase Radicals In Gaas Deposition Under Single Gas-Surface Collision Conditions
2. Pyrolysis of trimethylgallium on GaAs(100) surfaces
3. Kinetic Limits of Monolayer Growth on (001) Gaas by Organometallic Chemical-vapor Deposition
4. R. Creighton, Appl. Phys. Letters, in press.
5. Gas phase and surface reactions in the MOCVD of GaAs from triethylgallium, trimethylgallium, and tertiarybutylarsine
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2. Publications;The Journal of Physical Chemistry A;1998-10-01
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4. Simulation of carbon doping of GaAs during MOVPE;Journal of Crystal Growth;1992-11
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