Removal of polishing-induced damage from 6H-SiC(0001) substrates by hydrogen etching
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference14 articles.
1. Controlled growth of 3C‐SiC and 6H‐SiC films on low‐tilt‐angle vicinal (0001) 6H‐SiC wafers
2. Gas-source molecular beam epitaxy of monocrystalline β–SiC on vicinal α(6H)–SiC
3. Terrace growth and polytype development in epitaxial β-SiC films on α-SiC (6H and 15R) substrates
4. Effects of gas flow ratio on silicon carbide thin film growth mode and polytype formation during gas‐source molecular beam epitaxy
5. STM study of the SiC(0001) √3 × √3 surface
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