Chemical vapour deposition of copper on Si(111) and SiO2 substrates
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference24 articles.
1. Compound formation and bonding configuration at the Si-Cu interface
2. Laser chemical vapor deposition of copper
3. Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate
4. Selective low-temperature chemical vapor deposition of copper from (hexafluoroacetylacetonato)copper(I)trimethylphosphine, (hfa)CuP(Me)3
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2. Study of Cu-growth feature by selective low-pressure chemical vapor deposition using a CuI precursor;Japanese Journal of Applied Physics;2023-04-19
3. Room Temperature Growth of Silica Nanowires on Top of Ultrathin Si Nanowires Synthesized with Sn‐Cu Bimetallic Seeds;physica status solidi (a);2021-10-07
4. Low-pressure chemical vapor deposition of Cu on Ru using CuI as precursor;Journal of Crystal Growth;2020-11
5. β-Ketoiminato-based copper(ii) complexes as CVD precursors for copper and copper oxide layer formation;Dalton Transactions;2018
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