Deposition of silicon-based dielectrics by remote plasma-enhanced chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference25 articles.
1. Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devices
2. Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition
3. Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
4. Silicon nitride and silicon diimide grown by remote plasma enhanced chemical vapor deposition
5. Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation
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