Characterization of mirror-polished silicon wafers by Makyoh method-Reference-Cited by-同舟云学术

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Characterization of mirror-polished silicon wafers by Makyoh method

Published:1990-06 Issue:1-4 Volume:103 Page:437-442
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Tokura Seitaro,Fujino Nobukatsu,Ninomiya Masaharu,Masuda Kenji

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference3 articles.

1. Japan Patent Application;Kato;Laid-Open Publication No. 53-102776,1978

2. Japanese Patent Application;Kugimiya;Laid-Open Publication No. 57-186106,1981

3. Japanese Patent Application;Kugimiya;Laid-Open Publication No. 58-109805,1981

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modelling of the backside pattern transfer in magic mirror (Makyoh) imaging;Journal of Optics;2022-12-22

2. Optical Surface Metrology: Methods;A Practical Guide to Surface Metrology;2019

3. System approach to image formation in a magic mirror;Applied Optics;2009-02-23

4. Determination of flatness on patterned wafer surfaces using wavefront sensing methods;SPIE Proceedings;2008-09-29

5. Realisation of quantitative Makyoh topography using a digital micromirror device;SPIE Proceedings;2007-06-18

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