Anisotropic etching of silicon in TMAH solutions-Reference-Cited by-同舟云学术

Anisotropic etching of silicon in TMAH solutions

Published:1992-07 Issue:1 Volume:34 Page:51-57
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Tabata Osamu,Asahi Ryouji,Funabashi Hirofumi,Shimaoka Keiichi,Sugiyama Susumu

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Tactile image detection using a 1k-element silicon pressure sensor array;Sugiyama;Sensors and Actuators,1989

2. An infrared detector using poly-silicon p—n junction diode;Suzuki;Tech. Digest, 9th Sensor Symp., Japan,1990

3. Semiconductor Silicon;Electrochemical Society Softbound Proceedings Series, Princeton, NJ, USA,1973

4. Detection of discontinuities in passivating layers on silicon by NaOH anisotropic etch;Pugacz-Muraszkiewicz;IBM J. Res. Develop.,1972

5. Cesium hydroxide [CsOH]: a useful etchant for micromachining silicon;Clark;Tech. Digest, IEEE Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC, USA,1988

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