Author:
Grais Kh. I.,Shaltout A.A.,Ali S.S.,Boutros R.M.,El-behery K.M.,El-Sayed Z.A.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
7 articles.
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1. Sputtering yields of TiC and MAX phase Ti2AlC using Ne, Ar, Xe ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-09
2. Molecular dynamics simulations of Ar+ bombardment of Fe(0,0,1), (1,0,1), and (1,1,1) surfaces: Study of threshold energy and angular characteristics of sputtering;Vacuum;2023-09
3. Characterization of descriptors in machine learning for data-based sputtering yield prediction;Physics of Plasmas;2021-01
4. Low pressure microplasmas enabled by field ionization: Kinetic modeling;Applied Physics Letters;2016-05-09
5. The role of gas direction in a modified Grimm-type glow discharge for controlling the degree of crystallinity in brass alloy thin films;Vacuum;2015-11