From overall equipment efficiency (OEE) to overall Fab effectiveness (OFE)-Reference-Cited by-同舟云学术

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From overall equipment efficiency (OEE) to overall Fab effectiveness (OFE)

Published:2002-08 Issue:4-5 Volume:5 Page:333-339
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Oechsner Richard,Pfeffer Markus,Pfitzner Lothar,Binder Harald,Müller Eckhard,Vonderstrass Thomas

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference10 articles.

1. The International Technology Roadmap for Semiconductors (ITRS), 2001.

2. Ward, Ed et al., Accelerated Time to Market for Future 300-mm Fabs, Solid State Technology, November 1997. p. 99.

3. SEMI E35-0701—Cost of Ownership for Semiconductor Manufacturing Equipment Metrics.

4. SEMI E79-0200—Standard for Definition and Measurement of Equipment Productivity.

5. SEMI E10-0701—Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM).

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