Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy-Reference-Cited by-同舟云学术

Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy

Published:2002-04 Issue: Volume:91-92 Page:79-82
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Montgomery P.C.,Benatmane A.,Fogarassy E.,Ponpon J.P.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference13 articles.

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4. P.C. Montgomery, J.P. Fillard, in: G.M. Brown, O.Y. Kwon, M. Kujawinska, G.T. Reid (Eds.), Interferometry: Techniques and Analysis, Proc. SPIE (Bellingham, USA), vol. 1755, 1992, p. 12.

5. Interferometric profiler for rough surfaces

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