The effect of ultrasonic vibration and surfactant additive on fabrication of 53.5 gr/mm silicon echelle grating with low surface roughness in alkaline KOH solution-Reference-Cited by-同舟云学术

The effect of ultrasonic vibration and surfactant additive on fabrication of 53.5 gr/mm silicon echelle grating with low surface roughness in alkaline KOH solution

Published:2018-01 Issue: Volume:40 Page:937-943
ISSN:1350-4177
Container-title:Ultrasonics Sonochemistry
language:en
Short-container-title:Ultrasonics Sonochemistry

Author:

Jiao Qingbin,Zhu Chunlin,Tan Xin,Qi Xiangdong,Bayanheshig

Funder

National Youth Science Fund of China

Publisher

Elsevier BV

Subject

Acoustics and Ultrasonics,Radiology, Nuclear Medicine and imaging,Chemical Engineering (miscellaneous),Inorganic Chemistry,Organic Chemistry,Environmental Chemistry

Reference28 articles.

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3. Optical demultiplexer using a silicon echelette grating;Fujii;IEEE J. Quantum Electron.,1980

4. Wavelength demultiplexer: using echelette gratings on silicon substrate;Philippe;Appl. Opt.,1985

5. Crystallographically limited submicrometer gratings in (100) and (211) silicon;Sarathy;Opt. Lett.,1995

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