A study on the reactive sputtering process with plasma chemistry
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Handbook of Thin Film Process Technology;Berg,1998
2. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
3. Modeling the stability of reactive sputtering processes
4. Materials Science of Thin Films;Ohring,2002
5. Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings
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