Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution-Reference-Cited by-同舟云学术

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Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution

Published:2005-08 Issue:1-3 Volume:198 Page:314-318
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Iliescu Ciprian,Jing Ji,Tay Francis E.H.,Miao Jianmin,Sun Tietun

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

1. Tech. Dig. 9th Sensor Symp.;Shoji,1990

2. High quality mechanical etching of brittle materials by powder blasting

3. Characterization of reactive ion etching of glass and its applications in integrated optics

4. Fabrication of high-density electrical feed-throughs by deep-reactive-ion etching of Pyrex glass

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