Recent developments in pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference6 articles.
1. Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering
2. Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma
3. Substrate effects during mid-frequency pulsed DC biasing
4. Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron
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1. Pulsed-dc bias magnetron sputtered TiB2 ceramic coating;International Journal of Refractory Metals and Hard Materials;2024-04
2. Discharge channel structure revealed by plasma electrolytic oxidation of AZ31Mg alloy with magnetron sputtering Al layer and corrosion behaviors of treated alloy;Transactions of Nonferrous Metals Society of China;2024-01
3. Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering;Applied Surface Science;2023-10
4. Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations;Journal of Materials Science;2023-06
5. Mechanical and Structural Behaviors of HfN Thin Films Fabricated by Direct Current and Mid-frequency Magnetron Sputtering;CORROS SCI TECHNOL-K;2023
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