Hard Si–N–C films with a tunable band gap produced by pulsed glow discharge deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference24 articles.
1. Band gap engineering of SiCN film grown by pulsed laser deposition
2. Dependence of optical properties and hardness on carbon content in silicon carbonitride films deposited by plasma ion immersion processing technique
3. Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings
4. Structural characterization of amorphous SiCxNy chemical vapor deposited coatings
5. Synthesis of nanocrystalline silicon carbonitride films by remote plasma enhanced chemical vapor deposition using the mixture of hexamethyldisilazane with helium and ammonia
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4. Theoretical Study on the Decomposition Kinetics and Thermochemistry of Tetramethyldisilazane and Hexamethyldisilazane─Formation of Silanimine and Silene Species;The Journal of Physical Chemistry A;2022-10-31
5. SiOC films on C/C composite prepared by chemical vapor deposition with hexamethyldisilazane precursor;Ceramics International;2022-07
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