Dependence of surface tension and deposition rate of fluorocarbon polymer films on plasma parameters in a dielectric barrier discharge (DBD)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference8 articles.
1. Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor
2. Measurement of the absolute CF2concentration in a dielectric barrier discharge running in argon/fluorocarbon mixtures
3. Deposition of fluorocarbon polymer films in a dielectric barrier discharge (DBD)
4. I. P. Vinogradov, A. Lunk, Surf. and Coat. Tech. (in print).
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