Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD-Reference-Cited by-同舟云学术

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Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD

Published:2006-04 Issue:14-15 Volume:200 Page:4564-4571
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Grüniger A.,Bieder A.,Sonnenfeld A.,von Rohr Ph. Rudolf,Müller U.,Hauert R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. The Materials Science of Thin Films;Ohring,1992

2. Handbook of Deposition Technologies for Films and Coatings—Science, Technology and Applications;Thornton,1994

3. Plasma surface modification of polymers for improved adhesion: a critical review

4. Oxygen diffusion barrier properties of transparent oxide coatings on polymeric substrates

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1. Improvement of water and gas barrier properties of polycarbonate by the SiOx plasma treatment;Surfaces and Interfaces;2024-03

2. Silicon oxide anticorrosion coating deposition on alloy steel surface by low temperature plasma;Surface and Coatings Technology;2024-02

3. Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures;Vacuum;2023-01

4. Effect of Discharge Properties of the Oxide High Barrier Film Deposited by Roll-to-Roll MF-PECVD;Springer Proceedings in Physics;2023

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