Surface characterization of copper electroless deposition on atomic layer deposited palladium on iridium and tungsten-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Surface characterization of copper electroless deposition on atomic layer deposited palladium on iridium and tungsten

Published:2006-05 Issue:20-21 Volume:200 Page:5760-5766
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim Young-Soon,Shin Jiho,Cho Joong-Hee,Ten Eyck Gregory A.,Liu De-Li,Pimanpang Samuk,Lu Toh-Ming,Senkevich Jay J.,Shin Hyung-Shik

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference28 articles.

1. Controlling factors affecting the stability and rate of electroless copper plating

2. Advanced copper electroplating for application of electronics

3. Magnetic and microwave absorbing properties of Co–Fe thin films plated on hollow ceramic microspheres of low density

4. Fabrication of Ni–W–P nanowire arrays by electroless deposition and magnetic studies

5. Electroless plating of copper on polyimide films modified by plasma graft copolymerization with 4-vinylpyridine

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition (ALD) of palladium: from processes to applications;Critical Reviews in Solid State and Materials Sciences;2023-11-15

2. Activated palladium deposited on defect-rich carbon and cobalt oxide composite materials as bi-functional catalysts for stable rechargeable Zn–air battery;Applied Surface Science;2022-04

3. Metal-semiconductor oxide (WO3@W) induces an efficient electro–photo synergistic catalysis for MOR and ORR;Chemical Engineering Journal;2021-06

4. Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone;RSC Advances;2021

5. A facile approach for coating Ti3C2Tx on cotton fabric for electromagnetic wave shielding;Cellulose;2019-01-23

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3