Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone-Reference-Cited by-同舟云学术

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Published:2021 Issue:37 Volume:11 Page:22773-22779
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Zou Yiming¹²³⁴,Cheng Chunyu¹²³⁴,Guo Yuanyuan¹²³⁴,Ong Amanda Jiamin¹²³⁴^ORCID,Goei Ronn¹²³⁴^ORCID,Li Shuzhou¹²³⁴^ORCID,Yoong Tok Alfred Iing¹²³⁴^ORCID

Affiliation:

1. School of Materials Science and Engineering

2. Nanyang Technological University

3. Singapore 639798

4. Singapore

Abstract

Rh and Pd metallic thin films were fabricated by atomic layer deposition using Rh(acac)₃ and Pd(hfac)₂ precursors, and only low-concentration ozone as co-reactant.

Funder

Agency for Science, Technology and Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/RA/D1RA03942C

Reference60 articles.

1. Methanation of CO2 on supported rhodium catalyst

2. Production of hydrogen for fuel cells by steam reforming of ethanol over supported noble metal catalysts

3. Highly Selective Asymmetric Hydrogenation Using a Three Hindered Quadrant Bisphosphine Rhodium Catalyst

4. The influence of rhodium on SnO2-CO gas sensor

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