Modelling of sputtering yield amplification effect in reactive deposition of oxides-Reference-Cited by-同舟云学术

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Modelling of sputtering yield amplification effect in reactive deposition of oxides

Published:2010-08 Issue:23 Volume:204 Page:3882-3886
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kubart T.,Nyberg T.,Pflug A.,Siemers M.,Austgen M.,Koehl D.,Wuttig M.,Berg S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Control of reactive sputtering processes

2. High rate reactive magnetron sputter deposition of titanium oxide

3. Sputter erosion amplification

4. Preferential sputtering effects in thin film processing

5. Fundamental understanding and modeling of reactive sputtering processes

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1. Polaronic Nonlinear Optical Response and All‐Optical Switching Based on an Ionic Metal Oxide;Small;2023-12

2. Si sputtering yield amplification: a study of the collisions cascade and species in the sputtering plasma;Journal of Physics D: Applied Physics;2021-07-01

3. How microalloying of the Al target can improve process and film characteristics of sputtered alumina;Surface and Coatings Technology;2020-07

4. Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics;Coatings;2019-12-18

5. Study of C, Al, Si and Ge sputtering yield amplification by ion beam analysis and co-sputtering simulation software;Journal of Physics D: Applied Physics;2019-07-26

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