Metallic film deposition using a vacuum arc plasma source with a refractory anode-Reference-Cited by-同舟云学术

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Metallic film deposition using a vacuum arc plasma source with a refractory anode

Published:2009-12 Issue:6-7 Volume:204 Page:865-871
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Beilis Isak I.,Boxman Raymond L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference61 articles.

1. Directional and ionized physical vapor deposition for microelectronics applications

2. Ionized physical vapor deposition (IPVD): A review of technology and applications

3. Pulsed bias magnetron sputtering of thin films on insulators

4. Directional copper deposition using dc magnetron self-sputtering

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thin Zr Film Deposition Using a Refractory Anode Vacuum Arc Plasma Source;IEEE Transactions on Plasma Science;2022-09

2. Thin Zr Film Deposition Using a Refractory Anode Vacuum Arc Plasma Source;2020 29th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV);2021-09-27

3. Electrode Erosion. Macroparticle Generation;Plasma and Spot Phenomena in Electrical Arcs;2020

4. Vacuum Arc Plasma Sources. Thin Film Deposition;Plasma and Spot Phenomena in Electrical Arcs;2020

5. Plasma Generation in a Double Anode Vacuum Arc;IEEE Transactions on Plasma Science;2019-08

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