Directional and ionized physical vapor deposition for microelectronics applications-Reference-Cited by-同舟云学术

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Directional and ionized physical vapor deposition for microelectronics applications

Published:1998-09 Issue:5 Volume:16 Page:2585
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Rossnagel S. M.

Publisher

American Vacuum Society

Subject

General Engineering

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