Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode-Reference-Cited by-同舟云学术

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Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode

Published:2016-03 Issue: Volume:290 Page:73-76
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Barth Stephan,Bartzsch Hagen,Glöß Daniel,Frach Peter,Gittner Matthias,Labitzke Rainer

Funder

Grant-in-Aid for Technology

European Regional Development Fund

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference12 articles.

1. Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering;Bartzsch;Surf. Coat. Technol.,2000

2. Glow Discharge Processes;Chapman,1980

3. On the energy influx to the substrate during sputter deposition of thin aluminium films;Kersten;Thin Solid Films,1998

4. Properties of piezoelectric AlN layers deposited by reactive pulse magnetron sputtering;Bartzsch,2011

5. Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering;Tranchant;Surf. Coat. Technol.,2008

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2. Surface acoustic wave spectroscopy for non‐destructive coating and bulk characterization at temperatures up to 600°C enabled by piezoelectric aluminum nitride coated sensor;Surface and Interface Analysis;2024-02-13

3. Measured optical losses of Sc doped AlN waveguides;Optics Express;2024-01-30

4. High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area;Micromachines;2022-09-21

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