Study of metallic powder behavior in very low pressure plasma spraying (VLPPS) — Application to the manufacturing of titanium–aluminum coatings
Author:
Funder
IRTES/CEA
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference32 articles.
1. Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase
2. Plasma Spray-CVD: A New Thermal Spray Process to Produce Thin Films from Liquid or Gaseous Precursors
3. Very Low Pressure Plasma Spray—A Review of an Emerging Technology in the Thermal Spray Community
4. Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment
5. Process Conditions and Microstructures of Ceramic Coatings by Gas Phase Deposition Based on Plasma Spraying
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