Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration
Author:
Funder
National Partnerships Program
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference40 articles.
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4. High power impulse magnetron sputtering discharges and thin film growth: a brief review;Helmersson,2005
5. Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux;Capek;J. Phys. D. Appl. Phys.,2013
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