Impact of ion energies in Ar/H2 capacitively coupled radio frequency discharges on PEALD processes of titanium films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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4. Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes;Japanese Journal of Applied Physics;2020-04-29
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