Synthesis and characterization of electroless deposited Co–W–P thin films as diffusion barrier layer-Reference-Cited by-同舟云学术

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Synthesis and characterization of electroless deposited Co–W–P thin films as diffusion barrier layer

Published:2008-06 Issue:19 Volume:202 Page:4591-4597
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Abdel Aal A.,Barakat H.,Abdel Hamid Z.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference31 articles.

1. Electroless Plating;Mallory,1990

2. Electroless Nickel Plating;Riedel,1991

3. Electroless Plating: Fundamentals and Applications,1997

4. Electroless CoWP as a Diffusion Barrier between Electroless Copper and Silicon

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