Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses-Reference-Cited by-同舟云学术

Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulses

Published:2007-06 Issue:18 Volume:201 Page:7733-7738
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Martin N.,Lintymer J.,Gavoille J.,Chappé J.M.,Sthal F.,Takadoum J.,Vaz F.,Rebouta L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference19 articles.

1. High rate reactive sputtering process control

2. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

3. Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

4. Hysteresis effects in the sputtering process using two reactive gases

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